Resolution of the multiple aperture pixel by pixel enhancement of resolution electron lithography concept.

Journal article (2000)

Authors

BJ Kampherbeek ImPhys/Charged Particle Optics
MJJ Wieland ImPhys/Charged Particle Optics
P. Kruit ImPhys/Charged Particle Optics
Research Group
ImPhys/Charged Particle Optics
More Info
expand_more

Published Date

2000

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Research Group

ImPhys/Charged Particle Optics