Ultra-thin alumina and silicon nitride MEMS fabricated membranes for the electron multiplication

Journal article (2018)

Authors

V. Prodanovic EKL-Users - EEMCS
H.W. Chan Electronic Components, Technology and Materials - EEMCS
H. van der Graaf RST/Neutron and Positron Methods in Materials - AS
Pasqualina M Sarro Electronic Components, Technology and Materials - EEMCS
Research Group
EKL-Users (EEMCS) (TU Delft)
Copyright: © 2018 V. Prodanovic, H.W. Chan, H. van der Graaf, Pasqualina M Sarro
DOI: https://doi.org/10.1088/1361-6528/aaac66
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Published Date

2018

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Else Kooi Laboratory

Research Group

EKL-Users

Abstract

In this paper we demonstrate the fabrication of large arrays of ultrathin freestanding membranes (tynodes) for application in a timed photon counter (TiPC), a novel photomultiplier for single electron detection. Low pressure chemical vapour deposited silicon nitride (Si x N y ) and atomic layer deposited alumina (Al2O3) with thicknesses down to only 5 nm are employed for the membrane fabrication. Detailed characterization of structural, mechanical and chemical properties of the utilized films is carried out for different process conditions and thicknesses. Furthermore, the performance of the tynodes is investigated in terms of secondary electron emission, a fundamental attribute that determines their applicability in TiPC. Studied features and presented fabrication methods may be of interest for other MEMS application of alumina and silicon nitride as well, in particular where strong ultra-thin membranes are required.

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