Deep reactive ion etching in through-silicon via technology

Roozeboom, F; Blauw, MA; Lamy, Y; van Grunsven, E; Dekkers, W; Verhoeven, JF; van den Heuvel, F; van der Drift, E.W.J.M.; Kessels, WMM; van de Sanden, MCM

Deep reactive ion etching in through-silicon via technology

Book chapter (2007)

Authors

F Roozeboom External organisation

MA Blauw QN/Kavli Nanolab Delft -

Y Lamy External organisation

E van Grunsven External organisation

W Dekkers External organisation

JF Verhoeven External organisation

F van den Heuvel External organisation

E.W.J.M. van der Drift QN/Kavli Nanolab Delft -

WMM Kessels External organisation

MCM van de Sanden External organisation

Research Group

QN/Kavli Nanolab Delft () (TU Delft)

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Published Date

2007

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft