Alignment insensitive anisotropic etching of silicon cavities with smooth 49° sidewalls

Shen, C.; Pham, HTM; Sarro, Pasqualina M

Alignment insensitive anisotropic etching of silicon cavities with smooth 49° sidewalls

Conference paper (2009)

Authors

C. Shen Electronic Components, Technology and Materials -

HTM Pham Old - EWI Sect. ECTM

Pasqualina M Sarro Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

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Published Date

2009

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials