CV
C.L. Valentin
8 records found
1
Authored
Photolithography is the critical step in realizing a smaller feature size of Integrated Circuits (IC). Manufacturing beyond the 30 [nm] node requires tighter focus budgets in ArF immersion lithography systems [1]. Wafer non-flatness and lens heating are main focus-budget contribu
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Photolithography equipment manufacturers are continuously developing machines with ever increasing resolution and wafer throughput. The development has shown that previously less dominant performance limiting factors are increasingly impacting the conformity between the projected
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