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N Kalhor
Academic Work (1)
Conference paper (1)
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Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist
Conference paper (2015) -
N Kalhor (author)
,
W Mulckhuyse (author)
,
PFA Alkemade (author)
,
P. F.A. Alkemade (author)
,
P.F.A. Alkemade (author)
,
D Maas (author)
