Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist

Kalhor, N; Mulckhuyse, W; Alkemade, Paul; Maas, D

Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist

Conference paper (2015)

Authors

N Kalhor External organisation

W Mulckhuyse External organisation

Paul Alkemade QN/Kavli Nanolab Delft

D Maas External organisation

Research Group

QN/Kavli Nanolab Delft

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Published Date

2015

Language

English

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Research Group

QN/Kavli Nanolab Delft

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