Objective function and adjoint sensitivities for moving-mask lithography

Conference paper (2008)

Authors

A. van Keulen Computational Design and Mechanics - Mechanical, Maritime and Materials Engineering
Y Hirai External organisation
O Tabata External organisation
Research Group
Computational Design and Mechanics (Mechanical, Maritime and Materials Engineering) (TU Delft)
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Published Date

2008

Language

Undefined/Unknown

Reuse Rights

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Faculty

Mechanical, Maritime and Materials Engineering

Department

Precision and Microsystems Engineering

Research Group

Computational Design and Mechanics