Far-infrared sensor with LPCVD-deposited low-stress Si-rich nitride absorber membrane¿Part 2: Thermal property, and sensitivity

jutzi, F; Wicaksono, DHB; Pandraud, G; de rooij, N; French, P. J.

Far-infrared sensor with LPCVD-deposited low-stress Si-rich nitride absorber membrane¿Part 2: Thermal property, and sensitivity

Journal article (2009)

Authors

F jutzi External organisation

DHB Wicaksono Electronic Instrumentation

G Pandraud Electronic Components, Technology and Materials

N de rooij External organisation

P. J. French Electronic Instrumentation

Research Group

Electronic Instrumentation

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2009

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Research Group

Electronic Instrumentation

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