Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials

Fiorentino, G.; Morana, B.; Forte, S; Sarro, Pasqualina M

Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials

Journal article (2015)

Authors

G. Fiorentino Electronic Components, Technology and Materials -

B. Morana Electronic Components, Technology and Materials -

S Forte External organisation

Pasqualina M Sarro Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

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http://resolver.tudelft.nl/uuid:e6cb30a7-7008-4e7c-ad76-2f9683361dbe

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Published Date

2015

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials