An optimization approach for 3D photolithography utilizing DMD maskless exposure system

Conference paper (2014)

Authors

X. Ma Computational Design and Mechanics - Mechanical, Maritime and Materials Engineering
Y Kato External organisation
Y Hirai External organisation
F.C.M. van Kempen Computational Design and Mechanics - Mechanical, Maritime and Materials Engineering
A. van Keulen Computational Design and Mechanics - Mechanical, Maritime and Materials Engineering
T Tsuchiya External organisation
O Tabata External organisation
Research Group
Computational Design and Mechanics (Mechanical, Maritime and Materials Engineering) (TU Delft)
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Published Date

2014

Language

English

Reuse Rights

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Faculty

Mechanical, Maritime and Materials Engineering

Department

Precision and Microsystems Engineering

Research Group

Computational Design and Mechanics