Ultra thin gate oxides for 0.1 mm hetrojunction CMOS applications by the use of a sacrifical Si layer

Conference paper (1998)

Authors

R Loo External organisation
M Caymax External organisation
P Verheyen External organisation
T Conard External organisation
H Bender External organisation
W Vandervorst External organisation
N Collaert External organisation
KD Meyer External organisation
P.F.A. Alkemade Old - sect Electronic Materials (NS/EM)
I Szendrö External organisation
Research Group
Old - sect Electronic Materials (NS/EM)
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Published Date

1998

Language

Undefined/Unknown

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Research Group

Old - sect Electronic Materials (NS/EM)