Fabrication process of Si microlenses for OCT systems

Conference paper (2016)

Authors

A. Jovic Electronic Components, Technology and Materials -

G. Pandraud EKL Processing -

Kirill Zinoviev MedLumics

Jose L. Rubio MedLumics

E Margallo MedLumics

Pasqualina M Sarro Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

Fabrication Si microlenses Thermal photoresist reflow

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Published Date

2016

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials

Abstract

We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.