Deep dry etching process development for InP-based photonic crystals

van der Heijden, R; van der Drift, E.W.J.M.; Geluk, EJ; van der Heijden, RW; Karouta, F; Nouwens, PAM; Oei, YS; de Vries, T; Salemink, HWM

Deep dry etching process development for InP-based photonic crystals

Conference paper (2003)

Authors

R van der Heijden External organisation

E.W.J.M. van der Drift QN/Kavli Nanolab Delft -

EJ Geluk Electronic Components, Technology and Materials -

RW van der Heijden External organisation

F Karouta External organisation

PAM Nouwens External organisation

YS Oei Old - EWI Ch. Photonic Integrated Circuits

T de Vries Old - EWI Ch. Photonic Integrated Circuits

HWM Salemink External organisation

Research Group

QN/Kavli Nanolab Delft () (TU Delft)

Elektrotechniek Techniek

To reference this document use:

http://resolver.tudelft.nl/uuid:c6409478-f3e6-41e7-a647-265c885c376a

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Published Date

2003

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft