Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applications

Journal article (2013)

Authors

Y. Huang Electronic Components, Technology and Materials - EEMCS
G. Pandraud Electronic Components, Technology and Materials - EEMCS
Pasqualina Sarro Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2013

Language

English

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials