Limitations and complementary value of cryogenic SF6-O2 and Bosch plasma etch process for silicon micromachining

Conference paper (2001)

Authors

MA Blauw QN/Kavli Nanolab Delft
G Cracium External organisation
Patrick J. French Electronic Instrumentation
Research Group
QN/Kavli Nanolab Delft
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Published Date

2001

Language

Undefined/Unknown

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Research Group

QN/Kavli Nanolab Delft

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