High aspect ratio cyrogenic etching of Silicon with SF6/O2 plasma.

Conference paper (2001)

Authors

G Craciun Electronic Instrumentation - EEMCS
MA Blauw QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
P.J. French Electronic Instrumentation - EEMCS
Research Group
Electronic Instrumentation (EEMCS) (TU Delft)
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Published Date

2001

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation