Depth profile analysis of Si with low-energy and oblique O2+ beams.

Conference paper (1999)

Authors

ZX Jiang External organisation
P. F.A. Alkemade Old - sect Electronic Materials (NS/EM)
JLF Wang External organisation
Research Group
Old - sect Electronic Materials (NS/EM)
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Published Date

1999

Language

Undefined/Unknown

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Research Group

Old - sect Electronic Materials (NS/EM)

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