Microstructure characterization of location-controlled Si-islands crystallized by excimer laser in the mu-Czochralski (grain filter) process

Ishihara, R.; Danciu, D; Tichelaar, F.D.; He, M; Hiroshima, Y; Inoue, S; Shimoda, T; Metselaar, JW; Beenakker, C.I.M.

Microstructure characterization of location-controlled Si-islands crystallized by excimer laser in the mu-Czochralski (grain filter) process

Journal article (2007)

Authors

R. Ishihara Electronic Components, Technology and Materials -

D Danciu Electronic Components, Technology and Materials -

F.D. Tichelaar QN/High Resolution Electron Microscopy

M He Electronic Components, Technology and Materials -

Y Hiroshima External organisation

S Inoue External organisation

T Shimoda External organisation

JW Metselaar Electronic Components, Technology and Materials -

C.I.M. Beenakker Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

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Published Date

2007

Language

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials