Single step cryogenic SF6/O2 plasma etching process for the development of inertial devices

Craciun, G; Yang, H; van Zeijl, H.W.; Pakula, L.S.; Blauw, MA; van der Drift, E.W.J.M.; French, P.J.

Single step cryogenic SF6/O2 plasma etching process for the development of inertial devices

Conference paper (2002)

Authors

G Craciun Electronic Instrumentation -

H Yang Electronic Instrumentation -

H.W. van Zeijl Electronic Components, Technology and Materials -

L.S. Pakula Electronic Instrumentation -

MA Blauw QN/Kavli Nanolab Delft -

E.W.J.M. van der Drift QN/Kavli Nanolab Delft -

P.J. French Electronic Instrumentation -

Research Group

Electronic Instrumentation () (TU Delft)

Elektrotechniek Techniek

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Published Date

2002

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation