Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures

Cracium, G; Blauw, MA; van der Drift, EWJM; French, Paddy

Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures

Conference paper (2001)

Authors

G Cracium External organisation

MA Blauw QN/Kavli Nanolab Delft

EWJM van der Drift QN/Kavli Nanolab Delft

Paddy French Electronic Instrumentation

Research Group

QN/Kavli Nanolab Delft

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Published Date

2001

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Research Group

QN/Kavli Nanolab Delft

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