Lutetium coating of nanoparticles by atomic layer deposition

Moret, J.L.T.M.; Griffiths, Matthew B.E.; Frijns, Jeannine E.B.M.; Terpstra, B.E.; Wolterbeek, H.T.; Barry, Seán T.; Denkova, A.G.; van Ommen, J.R.

doi:10.1116/1.5134446

Lutetium coating of nanoparticles by atomic layer deposition

Journal article (2020)

Authors

J.L.T.M. Moret ChemE/Product and Process Engineering - , RID/KEWO/Stralingsbeschermingseenheid

Matthew B.E. Griffiths Carleton University

Jeannine E.B.M. Frijns Student

B.E. Terpstra RST/Technici Pool -

H.T. Wolterbeek RST/Applied Radiation & Isotopes -

Seán T. Barry Carleton University

A.G. Denkova RST/Applied Radiation & Isotopes -

J.R. van Ommen ChemE/Product and Process Engineering -

Research Group

RID/KEWO/Stralingsbeschermingseenheid

DOI: https://doi.org/10.1116/1.5134446

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Published Date

2020

Language

English

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Research Group

RID/KEWO/Stralingsbeschermingseenheid

Abstract

Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO₂ nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)₃ and the custom-made Lu(HMDS)₃. Using Lu(TMHD)₃, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)₃, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.

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