Novel post-etching treatment of small windows in oxide for selective epitaxial growth

Maes, JWH; Caro, J.; Visser, CCG; Zijlstra, T; van der Drift, E.W.J.M.; Radelaar, S; Tichelaar, F.D.; Fakkeldij, EJM

Novel post-etching treatment of small windows in oxide for selective epitaxial growth

Journal article (1997)

Authors

JWH Maes Old organisation TN/TechnischeNatuurkunde voorm

J. Caro QN/Fysics of NanoElectronics

CCG Visser External organisation

T Zijlstra QN/Kavli Nanolab Delft -

E.W.J.M. van der Drift QN/Kavli Nanolab Delft -

S Radelaar OLD Metals Processing, Microstructures and Properties

F.D. Tichelaar OLD Virtual Materials and Mechanics

EJM Fakkeldij External organisation

Department

Old organisation TN/TechnischeNatuurkunde voorm

To reference this document use:

http://resolver.tudelft.nl/uuid:53314713-7291-44b1-ac40-3786f3d68696

More Info

expand_more

Published Date

1997

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Department

Old organisation TN/TechnischeNatuurkunde voorm