Some recent developments in chemical vapor deposition process and equipment modelling.

Kleijn, C.R.; Kuijlaars, KJ; Okkerse-Ruitenberg, M; van Santen, H; van den Akker, H.E.A.

Some recent developments in chemical vapor deposition process and equipment modelling.

Journal article (1999)

Authors

C.R. Kleijn Old - sect Kramers Laboratory (MSP/FT)

KJ Kuijlaars Old - sect Kramers Laboratory (MSP/FT)

M Okkerse-Ruitenberg Old - sect Kramers Laboratory (MSP/FT)

H van Santen Old - sect Kramers Laboratory (MSP/FT)

H.E.A. van den Akker Old - sect Kramers Laboratory (MSP/FT)

Research Group

Old - sect Kramers Laboratory (MSP/FT)

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Published Date

1999

Language

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Research Group

Old - sect Kramers Laboratory (MSP/FT)