Preparation of nanometer-scale windows in SiO2 for selective epitaxial growth of Si based divices

Maes, JWH; Lukey, PW; Zijlstra, T; Visser, CCG; Caro, J.; van der Drift, E.W.J.M.; Tichelaar, F.D.; Radelaar, S

Preparation of nanometer-scale windows in SiO2 for selective epitaxial growth of Si based divices

Journal article (1997)

Authors

JWH Maes Old organisation TN/TechnischeNatuurkunde voorm

PW Lukey External organisation

T Zijlstra QN/Kavli Nanolab Delft

CCG Visser External organisation

J. Caro QN/Fysics of NanoElectronics

E.W.J.M. van der Drift QN/Kavli Nanolab Delft

F.D. Tichelaar OLD Virtual Materials and Mechanics

S Radelaar OLD Metals Processing, Microstructures and Properties

Department

Old organisation TN/TechnischeNatuurkunde voorm

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Published Date

1997

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Department

Old organisation TN/TechnischeNatuurkunde voorm

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