Helium depth profiles in silicon and silicon based materials: implantation energies from 20 to 400 keV

Report (1999)

Authors

I Montilla External organisation
A Rivera Old - Section Defects in Materials
A van Veen Old - Section Defects in Materials
Research Group
Old - Section Defects in Materials
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Published Date

1999

Language

Undefined/Unknown

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Research Group

Old - Section Defects in Materials

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