Design rules for Patterning in Deep Cavities Formed by TMAH-etching of Si

Conference paper (2008)

Authors

L Gu Old - EWI Sect. ECTM
W.H.A. Wien Electronic Components, Technology and Materials - EEMCS
LK Nanver Electronic Components, Technology and Materials - EEMCS
Research Group
Old - EWI Sect. ECTM
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Published Date

2008

Language

Undefined/Unknown

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Research Group

Old - EWI Sect. ECTM