Investigation and characterization of silicon nitride thin films deposited by ECR-CVD plasma for Microelectromechanical systems application

Biasotto, C; Diniz, JA; Daltrini, AM; Moshkalyov, SA; Monteiro, MJR

Investigation and characterization of silicon nitride thin films deposited by ECR-CVD plasma for Microelectromechanical systems application

Journal article (2007)

Authors

C Biasotto Microelectronics

JA Diniz External organisation

AM Daltrini External organisation

SA Moshkalyov External organisation

MJR Monteiro External organisation

Department

Microelectronics

Elektrotechniek Techniek

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Published Date

2007

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Department

Microelectronics

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