Chemical vapor deposition of Ga dopants for fabricating ultrashallow p-n junctions at 400 *C

Conference paper (2010)

Authors

A Sammak Electronic Components, Technology and Materials
L Qi External organisation
Wiebe de Boer Electronic Components, Technology and Materials
LK Nanver Electronic Components, Technology and Materials
Research Group
Electronic Components, Technology and Materials
More Info
expand_more

Published Date

2010

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Research Group

Electronic Components, Technology and Materials