High-performance wafer-scale transfer-free graphene microphones

Conference paper (2023)

Authors

R. Pezone Electronic Components, Technology and Materials - EEMCS
G. Baglioni Kavli institute of nanoscience Delft, QN/van der Zant Lab - AS
Pasqualina M Sarro Electronic Components, Technology and Materials - EEMCS
P.G. Steeneken Kavli institute of nanoscience Delft, Dynamics of Micro and Nano Systems - Mechanical, Maritime and Materials Engineering , QN/Steeneken Lab - AS
S. Vollebregt Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
Copyright: © 2023 R. Pezone, G. Baglioni, Pasqualina M Sarro, P.G. Steeneken, S. Vollebregt
DOI: https://doi.org/10.1109/MEMS49605.2023.10052360
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Published Date

2023

Language

English

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials

Abstract

A repeatable method to fabricate multi-layer graphene (ML-gr) membranes of 2r = 85 - 155 μm (t < 10 nm) with a 100% yield on 100 mm wafers is demonstrated. These membranes show higher sensitivity than a commercial MEMS-Mic combined with an area reduction of 10x. The process overcomes one of the main limitations when integrating graphene diaphragms in microphones due to the absence of automatic transfer methods on non-planarized target substrates. This method aims to overcome this limitation by combining a full-dry release of Chemical Vapor Deposition (CVD) graphene by Deep Reactive Ion Etching (DRIE) and vapor HF (VHF).

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