Preparation of large, location-controlled Si grains by excimer-laser crystallization of a-Si films sputtered at 100C

He, M; Ishihara, R; Beenakker, C.I.M.

Preparation of large, location-controlled Si grains by excimer-laser crystallization of a-Si films sputtered at 100C

Conference paper (2007)

Authors

M He Electronic Components, Technology and Materials

R Ishihara Electronic Components, Technology and Materials

C.I.M. Beenakker Electronic Components, Technology and Materials

Research Group

Electronic Components, Technology and Materials

Elektrotechniek Techniek

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2007

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Research Group

Electronic Components, Technology and Materials

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