Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins

Conference paper (2007)

Authors

V Jovanovi¿ External organisation
S Milosavljevi¿ External organisation
L.K. Nanver Electronic Components, Technology and Materials - EEMCS
T Suligoj External organisation
P Biljanovi¿ External organisation
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2007

Language

Undefined/Unknown

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials