The Near Field Characteristics of teh Focused Field Embedded in the Super-RENS Layer Applied to Lithography

da Costa Assafrao, A.; Pereira, Silvania F.; Paul Urbach, H. P.

The Near Field Characteristics of teh Focused Field Embedded in the Super-RENS Layer Applied to Lithography

Journal article (2012)

Authors

A. da Costa Assafrao ImPhys/Optics

Silvania F. Pereira ImPhys/Optics

H. P. Paul Urbach ImPhys/Optics

Research Group

ImPhys/Optics

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Published Date

2012

Language

English

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Research Group

ImPhys/Optics

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