The Near Field Characteristics of teh Focused Field Embedded in the Super-RENS Layer Applied to Lithography

Journal article (2012)

Authors

A. da Costa Assafrao ImPhys/Optics - AS
S.F. Pereira ImPhys/Optics - AS
Paul Urbach ImPhys/Optics - AS
Research Group
ImPhys/Optics (AS) (TU Delft)
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Published Date

2012

Language

English

Reuse Rights

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics