Far-infrared sensor with LPCVD-deposited low-stress Si-rich nitride absorber membrane-part 2.Thermal property and sensitivity

Journal article (2009)

Authors

F jutzi External organisation
DHB Wicaksono Electronic Instrumentation - EEMCS
G. Pandraud Electronic Instrumentation - EEMCS
N de rooij External organisation
P.J. French Electronic Instrumentation - EEMCS
Research Group
Electronic Instrumentation (EEMCS) (TU Delft)
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Published Date

2009

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation