Prosthetic failure due to implant-associated infections remains a big problem, despite the extensive use of implants and number of researches performed on this topic. A new problem arises with the development of additively manufactured complex orthopedic metal implants. In spite of the advantages that come with patient specific implants to cure the most critical orthopedic situations, these implants are inherent to infection susceptibility. Currently, no study has shown deposition on such complex implants, therefore this research aims to make the first steps towards an antibacterial coating deposited on additively manufactured complex implants to fight peri implant infections. This is facilitated by means of electrophoretic deposition. In order to develop homogeneous deposition of a chitosan/gelatin based coating loaded with vancomycin or gentamicin on titanium implants, a state-of-the-art setup was used, containing a cylindrical counter electrode surrounding the complex specimen. After parameter optimization, in vitro release behaviour, cell viability assays and antibacterial tests were performed, in order to investigate the biological behaviour of the coating. The release behaviour, which was dependent on coating degradation, showed a burst release after one day followed by sustained release up to day seven. Specimen including antibiotics showed antibacterial effect against S. Aureus. While all planktonic bacteria where eradicated, biofilm formation by adherent bacteria was significantly decreased, however not prevented. Cell viability assay showed bacterial adherence and growth, with an increased rate in the gentamicin samples, potentially caused by the high hydrophilicity of this drug. While an in vivo study is suggested to obtain more in-depth insights in the biological behaviour of the coating, this method is suggested to be a successful way to create a homogeneous coating against peri implant infections on complex implants, preventing peri implant infections, to reduce the change of patient specific implant revision.