We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography, using PdH_x as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium pressure for all substrates studied. Comparing these thin films with free-standing films-measured both by hydrogenography and by Sievert's method-we find a very similar behavior. Hence, thin films can be used to study the hydrogenation behavior of the corresponding bulk materials.