Throughout the development of silicon heterojunction (SHJ) solar cells, the transparent conductive oxide has been regarded as an essential component of their front electrode, facilitating lateral charge transport of photogenerated carriers toward the front metal grid fingers. In rear junction (RJ)-SHJ solar cells, the (n)c-Si bulk is known to support the lateral electron transport at maximum power point injection level, provided that the contact resistance of the front contact stack is sufficiently low. This enables experimental RJ-SHJ solar cell architectures featuring a localized front carrier-selective passivating contact exclusively covering the area contacted by the metal grid. Herein, a top-down approach to the synthesis of this type of architecture is studied and its optical and electrical performance applied to different (n)-type contacts are investigated. Additionally, the potential of the localized contact architecture through Cu-plated RJ-SHJ solar cells is demonstrated. These solar cell demonstrators feature high short-circuit current density of 40.5 mA cm⁻², without significantly compromising their open-circuit voltage or fill factor, enabling efficiencies well above 23%, a 2%_abs improvement compared to their state before localization of the front contact.