CV doping profiling of boron out-diffusion using an abrupt and highly doped arsenic buried epilayer

Ortiz, C; Nanver, L.K.; van Noort, WD; Scholtes, T.L.M.; Slotboom, JW

CV doping profiling of boron out-diffusion using an abrupt and highly doped arsenic buried epilayer

Conference paper (2002)

Authors

C Ortiz Electronic Components, Technology and Materials -

L.K. Nanver Electronic Components, Technology and Materials -

WD van Noort Electronic Components, Technology and Materials -

T.L.M. Scholtes Electronic Components, Technology and Materials -

JW Slotboom Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

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Published Date

2002

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials