CMOS Compatible Fabrication of Mid Infrared Microspectrometers Based on an Array of Metamaterial Absorbers

Conference paper (2019)

Authors

Mohammad Amir Ghaderi Chalmers University of Technology

Peter Enoksson Chalmers University of Technology

R.F. Wolffenbuttel Electronic Instrumentation -

Research Group

Electronic Instrumentation () (TU Delft)

CMOS Compatible fabrication MEMS spectrometer Metamaterial midinfrared absorber Mid-IR detector array

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Published Date

2019

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation

Abstract

The design of a mid-infrared micro-spectrometer based on an array of differently tuned narrow-band metamaterial absorbers is presented. The spectral response is tailored by the design of the unit cell. Each spectral band is composed of a thermopile detector with a 300 ×180 μm² Al-based metamaterial absorber fabricated in a CMOS compatible post-process. The challenges in the fabrication of the sub-μm features within the unit cell over a several mm² absorber area by equipment that is part of the standard infrastructure of a MEMS facility is addressed. The design and fabrication method utilized here for the first time enables the CMOS fabrication of integrated large-area plasmonic components on thermal detectors.

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