Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices

Journal article (2011)

Authors

M Rosso ChemE/Product and Process Engineering
Volkert van Steijn ChemE/Product and Process Engineering
Louis C P M De Smet OLD ChemE/Organic Materials and Interfaces
E.J.R. Sudholter OLD ChemE/Organic Materials and Interfaces
Chris Kleijn MSP/Thermal & Materials Processes
Michiel T. Kreutzer ChemE/Product and Process Engineering
Research Group
ChemE/Product and Process Engineering
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Published Date

2011

Language

English

Reuse Rights

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Research Group

ChemE/Product and Process Engineering