Distribution of boron and phosphorus during alloying and slag treatment of metallurgical grade silicon.

Meteleva-Fischer, YV; Yang, Y.; Boom, Rob; Kraaijveld, B; Kuntzel, H

Distribution of boron and phosphorus during alloying and slag treatment of metallurgical grade silicon.

Conference paper (2012)

Authors

YV Meteleva-Fischer OLD Surface and Interface Engineering

Y. Yang OLD Metals Processing, Microstructures and Properties

Rob Boom OLD Metals Processing, Microstructures and Properties

B Kraaijveld External organisation

H Kuntzel External organisation

Research Group

OLD Surface and Interface Engineering

To reference this document use:

http://resolver.tudelft.nl/uuid:d400b43d-cde7-477a-be6d-0afef1e3b52f

More Info

expand_more

Published Date

2012

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Research Group

OLD Surface and Interface Engineering

No files available

Metadata only record. There are no files for this conference paper.