X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

Journal article (2002)

Authors

L. Jiang External organisation
AG Fitzgerald External organisation
MJ Rose External organisation
R Cheung External organisation
B Rong External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft
Research Group
QN/Kavli Nanolab Delft
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Published Date

2002

Language

Undefined/Unknown

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Research Group

QN/Kavli Nanolab Delft

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