What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe3 and oxygen?

Journal article (2024)

Authors

Hao Van Bui Phenikaa University, Yen Nghi
Anh Phan Nguyen Phenikaa University, Yen Nghi
Manh Duc Dang Phenikaa University, Yen Nghi
Truong Duc Dinh Phenikaa University, Yen Nghi
Patricia J. Kooyman University of Cape Town
J.R. van Ommen ChemE/Product and Process Engineering - AS
Research Group
ChemE/Product and Process Engineering (AS) (TU Delft)
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Published Date

2024

Language

English

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Faculty

Applied Sciences

Department

ChemE/Chemical Engineering

Research Group

ChemE/Product and Process Engineering

Abstract

We explore the low-temperature limit of atomic layer deposition of Pt using MeCpPtMe3 and O2. We reveal that by supplying a sufficiently high O2 exposure, highly dispersed and thermally stable Pt sub-nanometer clusters can be deposited onto the surface of P25 TiO2 nanoparticles even at room temperature by atmospheric-pressure ALD.

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