A study of the CMP effect on the quality of thin silicon films crystallized by using the ¿-Czochralski process

Journal article (2009)

Authors

J Derakhshandeh External organisation

M.R. Tajari Mofrad Electronic Components, Technology and Materials -

R. Ishihara Electronic Components, Technology and Materials -

J. van der Cingel Electronic Components, Technology and Materials -

C.I.M. Beenakker Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

To reference this document use:

http://resolver.tudelft.nl/uuid:b5a4b2a3-327a-45ba-bcb1-ad1b12221c5f

More Info

expand_more

Published Date

2009

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials