The interaction of NO, O2 and CO with Cu(100) and Cu(110)

Journal article (1991)

Authors

R. Balkenende Universiteit Utrecht
H. den Daas Universiteit Utrecht
M Huisman Universiteit Utrecht
O. L.J. Gijzeman Universiteit Utrecht
JW Geus Universiteit Utrecht
Affiliation
External organisation
More Info
expand_more

Published Date

01-06-1991

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Affiliation

External organisation

Abstract

Exposure of NO or O2 to Cu(100) or Cu(110) (at temperatures between 370 and 670 K, pressures up to 0.1 Pa) leads to dissociative adsorption. Dissociation on Cu(110) is about an order of magnitude faster than on Cu(100). Saturation of the surface coverage (for both surfaces at about 0.42 monolayer) is followed by the structure-intensitive penetration of oxygen atoms into the crystal. Reduction proceeds via reaction of adsorped CO and adsorbed oxygen, the effect of nitrogen can be explained by site-blocking. Again, the reaction is about an order of magnitude faster on Cu(110) than on Cu(100). In the case of Cu(100) a transition from a disordered to an ordered overlayer is observed at a fractional surface coverage of about 0.3. Nitrogen desorption is more difficult from Cu(100) than from Cu(110). The desorption temperature depends on the presence of oxygen (adsorbed as well as penetrated). At high CO pressures the formation of isocyanate facilitates the desorption of nitrogen.