Helium on lithography

Book chapter (2011)

Authors

E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
D.J. Maas External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
More Info
expand_more

Published Date

2011

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft