Influence of sputter pressure on magnetic and structural properties of Permalloy thin films

Journal article (2023)

Authors

Sukhvinder Singh Saarland University

L. Abelmann Bio-Electronics - , Korea Institute of Science and Technology

Haibin Gao Saarland University

Uwe Hartmann Saarland University

Research Group

Bio-Electronics () (TU Delft)

DOI: https://doi.org/10.1016/j.jmmm.2023.171138

Sputtering Magnetic domains Permalloy Magnetic force microscopy

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Published Date

2023

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Bio-Electronics

Abstract

Well-defined and technically relevant domain configurations are sought in patterned magnetic thin films. We used Magnetic Force Microscopy to investigate these in square-patterned Permalloy films. The films were prepared using dc sputter deposition by varying the Argon pressure from 1.5×10−3 to 30.0×10−3 mbar. The Landau domain configuration was found in films prepared at 1.5×10−3 mbar pressure. With an increase in pressure, tulip and irregular domains were consecutively formed. Based on magnetic and structural characterizations, an increase in coercivity and a decrease in Permalloy film density were observed at the same time.

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