High-rate deposition of microcrystalline silicon with an expanding thermal plasma

Smit, C; Klaver, A; Korevaar, BA; Petit, AMHN; Williamson, DL; van Swaaij, Rene; van de Sanden, MCM

High-rate deposition of microcrystalline silicon with an expanding thermal plasma

Journal article (2005)

Authors

C Smit Electronic Components, Technology and Materials

A Klaver Electronic Components, Technology and Materials

BA Korevaar Electronic Components, Technology and Materials

AMHN Petit Electronic Components, Technology and Materials

DL Williamson External organisation

Rene van Swaaij Electronic Components, Technology and Materials

MCM van de Sanden External organisation

Research Group

Electronic Components, Technology and Materials

To reference this document use:

http://resolver.tudelft.nl/uuid:8a615984-faba-426a-966a-92f57d185c45

More Info

expand_more

Published Date

2005

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Research Group

Electronic Components, Technology and Materials

No files available

Metadata only record. There are no files for this journal article.