Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films.

Journal article (1999)

Authors

KF Feenstra External organisation
P.F.A. Alkemade Old - sect Electronic Materials (NS/EM)
E Algra External organisation
REI Schropp External organisation
W.F. van der Weg External organisation
Research Group
Old - sect Electronic Materials (NS/EM)
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Published Date

1999

Language

Undefined/Unknown

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Research Group

Old - sect Electronic Materials (NS/EM)

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