Limiting Factors for electron beam lithography when using ultra-thin HSQ layers

Grigorescu, AE; van der Krogt, M. C.; Hagen, C.W.

Limiting Factors for electron beam lithography when using ultra-thin HSQ layers

Journal article (2007)

Authors

AE Grigorescu ImPhys/Charged Particle Optics

M. C. van der Krogt QN/Kavli Nanolab Delft

C.W. Hagen ImPhys/Charged Particle Optics

Research Group

ImPhys/Charged Particle Optics

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Published Date

2007

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Research Group

ImPhys/Charged Particle Optics

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